Intel Foundry, ASML present High NA EUV production progress at SPIE Photomask conference

Reuters2026/09/08 06:08

Bitget offers one-stop trading for cryptocurrencies, stocks, and gold. Trade now!

A welcome pack worth 6200 USDT for new users! Sign up now!

Intel Foundry attended the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference to highlight progress on High NA EUV readiness.
High NA EUV is in high-volume manufacturing at Intel, with more than 1,000,000 wafers processed across certification, R&D, and select production layers.
Intel 18A layers patterned with High NA are meeting or exceeding performance versus comparable layers patterned on ASML’s 0.33 NA NXE EUV platform.
The companies emphasized near-term High NA use with standard 6-inch masks, supported by reticle stitching and PDK solutions.
Intel continues to push an industry shift toward 6x12-inch masks, aiming to align standards and infrastructure for future High NA scaling.

Disclaimer: This news brief was created by Public Technologies (PUBT) using generative artificial intelligence. While PUBT strives to provide accurate and timely information, this AI-generated content is for informational purposes only and should not be interpreted as financial, investment, or legal advice. Intel Corporation published the original content used to generate this news brief via Business Wire (Ref. ID: 202609080203BIZWIRE_USPR_____20260907_BW972389) on September 08, 2026, and is solely responsible for the information contained therein.

Disclaimer: The content of this article solely reflects the author's opinion and does not represent the platform in any capacity. This article is not intended to serve as a reference for making investment decisions.

Understand the market, then trade.

Bitget offers one-stop trading for cryptocurrencies, stocks, and gold.

Trade now！

Intel Foundry, ASML present High NA EUV production progress at SPIE Photomask conference

You may also like

Crypto prices